Fundamentals of Nanoscale Film Analysis

Przednia okładka
Springer Science & Business Media, 3 kwi 2007 - 336

Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.

The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.

Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.

 

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Spis treści

Problems
126
ElectronDiffraction
152
Photon Absorption in Solids and EXAFS
174
Radiative Transitions and the Electron Microprobe
214
NonradiativeTransitionsandAugerElectronSpectroscopy
234
Activation Analysis and Prompt Radiation Analysis
255
Scanning Probe Microscopy
277
KM for 4He+ as Projectile and Integer Target Mass
291

75
71
84
88
Problems
103
ElectronSpectroscopies
105
105
106
Electron Configurations and Ionization Potentials of Atoms
299
Appendix6 ElectronBindingEnergies
305
Appendix13
309
Index
330
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