Introduction to Focused Ion Beams: Instrumentation, Theory, Techniques and Practice

Przednia okładka
Lucille A. Giannuzzi, North Carolina State University
Springer Science & Business Media, 19 lis 2004 - 358
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
 

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Spis treści

THE FOCUSED ION BEAM INSTRUMENT
xvii
IONSOLID INTERACTIONS
11
FOCUSED ION BEAM GASES FOR DEPOSITION AND ENHANCED ETCH
51
THREEDIMENSIONAL NANOFABRICATION USING FOCUSED ION BEAMS
71
DEVICE EDITS AND MODIFICATIONS
85
THE USES OF DUAL BEAM FIB IN MICROELECTRONIC FAILURE ANALYSIS
105
HIGH RESOLUTION LIVE IMAGING OF FIB MILLING PROCESSES FOR OPTIMUM ACCURACY
131
FIB FOR MATERIALS SCIENCE APPLICATIONSA REVIEW
141
FOCUSED ION BEAM SECONDARY ION MASS SPECTROMETRY FIBSIMS
267
QUANTITATIVE THREEDIMENSIONAL ANALYSIS USING FOCUSED ION BEAM MICROSCOPY
279
APPLICATION OF FIB IN COMBINATION WITH AUGER ELECTRON SPECTROSCOPY
299
Ga Ion Sputter Yields
327
Backsputtered Ga Ion Fraction
331
30 keV Ga Ion Range at 0 degrees
335
30 keV Ga Ion Range at 88 degrees
339
5 keV Ga Ion Range at 0 degrees
343

PRACTICAL ASPECTS OF FIB TEM SPECIMEN PREPARATION With Emphasis On Semiconductor Applications
171
FIB LIFTOUT SPECIMEN PREPARATION TECHNIQUES ExSitu and InSitu Methods
199
A FIB MICROSAMPLING TECHNIQUE AND A SITE SPECIFIC TEM SPECIMEN PREPARATION METHOD
227
DUALBEAM FIBSEM SYSTEMS Techniques and A utomated Applications
245
5 keV Ga Ion Range at 88 degrees
347
Notes
351
Index
353
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